The technology in an Intel chip that enabled the fabrication of 45 nm microprocessors in 2007. As elements in the chip were being reduced to 45 nanometers, the gate dielectric began to lose its ...

In logic devices such as finFETs (field-effect transistors), metal gate parasitic capacitance can negatively impact electrical performance. One way to reduce this parasitic capacitance is to optimize ...

On Nov. 12, Intel shipped the first 45-nanometer microprocessors using high-k metal-gate technology. Whether to underscore the significance of the event or to reinforce that his famous law remains on ...