Abstract: Low resistance and leakage current are crucial for reliable electrical interconnections, but these properties become increasingly difficult to maintain as bandwidth scaling leads to increase ...

Escuela de Ingeniería y Ciencias, Campus Guadalajara, Tecnologico de Monterrey, Av. General Ramon Corona 2514, C.P. 45201 Zapopan, Jalisco, Mexico Tecnologico de Monterrey, Institute for Obesity ...

Abstract: For the first time, a novel damage-free neutral beam-assisted atomic etching process has successfully demonstrated the removal of the residual high-k dielectric layer after gate patterning.

This DIY project shows how to etch metal the easy way—right on a hammer! Follow the step-by-step process to achieve clean, striking patterns that make your tools one of a kind. Game 3 of the World ...